The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Apr. 12, 2018
Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Naoki Ishibashi, Joetsu, JP;

Yuki Miyake, Joetsu, JP;

Yusuke Nagae, Joetsu, JP;

Takeshi Kinsho, Joetsu, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07C 45/00 (2006.01); C07C 4/10 (2006.01); C07C 47/12 (2006.01); C07C 11/12 (2006.01);
U.S. Cl.
CPC ...
C07C 4/10 (2013.01); C07C 11/12 (2013.01); C07C 45/004 (2013.01); C07C 47/12 (2013.01);
Abstract

Methods of producing a 2,4-dienal acetal compound and a 2,4-dienal compound useful as synthesis intermediates of a sex pheromone compound having a conjugated diene structure or a conjugated triene structure. More specifically, a method produces a 2,4-dienal acetal compound of Formula (2): RCH═CH—CH═CH—CH(OR)(OR), including a step of subjecting a 2-enal acetal compound having a leaving group X at position C5 and being expressed by Formula (1): RCHX—CH—CH═CH—CH(OR)(OR) to an elimination reaction in the presence of a base to obtain the 2,4-dienal acetal compound (2); and a method for producing a 2,4-dienal compound of Formula (3): RCH═CH—CH═CH—CHO, further including a step of deprotecting the 2,4-dienal acetal compound (2) to obtain the 2,4-dienal compound (3).


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