The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Jul. 22, 2014
Applicant:

Kurita Water Industries Ltd., Tokyo, JP;

Inventors:

Ikunori Yokoi, Tokyo, JP;

Takeo Fukui, Tokyo, JP;

Yoichi Tanaka, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 9/027 (2006.01); B08B 9/032 (2006.01); B01D 61/14 (2006.01); B01D 61/58 (2006.01); B01D 65/02 (2006.01); C02F 1/44 (2006.01); C02F 1/42 (2006.01); C02F 1/32 (2006.01); C02F 9/00 (2006.01); B08B 3/14 (2006.01); B01D 61/02 (2006.01); C02F 1/20 (2006.01); C02F 103/04 (2006.01);
U.S. Cl.
CPC ...
C02F 9/00 (2013.01); B01D 61/022 (2013.01); B01D 61/142 (2013.01); B01D 61/58 (2013.01); B01D 65/02 (2013.01); B08B 3/14 (2013.01); B08B 9/027 (2013.01); B08B 9/032 (2013.01); C02F 1/444 (2013.01); B01D 61/025 (2013.01); B01D 61/145 (2013.01); B01D 61/147 (2013.01); B01D 2311/2623 (2013.01); B01D 2311/2692 (2013.01); B01D 2317/04 (2013.01); C02F 1/20 (2013.01); C02F 1/32 (2013.01); C02F 1/325 (2013.01); C02F 1/42 (2013.01); C02F 1/441 (2013.01); C02F 2103/04 (2013.01); C02F 2301/043 (2013.01); C02F 2303/04 (2013.01); C02F 2303/16 (2013.01);
Abstract

Contaminants present inside an ultrapure water production system are prevented from being fed into a feed pipe connected to a water use point and, after sterilization cleaning, the system is prevented from being contaminated by contaminants captured on a microparticle removal membrane during sterilization cleaning. Ultrapure water having high quality is thereby fed to a water use point within a short period of time. An ultrapure water production system is provided with a tank, a pump, a heat exchanger, an ultraviolet device, an ion-exchange device, a first microparticle removal membrane device, and a second microparticle removal membrane device. Parts of sterilization water and flush water are fed into the first microparticle removal membrane device and discharged from a feedwater-side potion to a concentrated-water-side portion without permeating through a microparticle removal membrane thereof, and the remaining part of the water is passed through the second microparticle removal membrane device.


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