The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Dec. 18, 2014
Showa Denko K.k., Tokyo, JP;
Ichiro Ota, Chiba, JP;
SHOWA DENKO K.K., Tokyo, JP;
Abstract
A carbon film forming method, that introduces a raw material gas including carbon into a film forming chamber, ionizes the gas by using an ion source, accelerates the ionized gas, and radiates the ionized gas to a surface of a substrate to form a carbon film on the surface of the substrate, includes forming the carbon film while rotating a first magnet, which is provided on the opposite side of the substrate across a region in which the raw material gas is ionized so as to be eccentric and/or inclined with respect to a central axis connecting the center of the ion source and a position corresponding to the center of the substrate held by the holder, in a circumferential direction.