The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2018

Filed:

Jan. 12, 2015
Applicants:

Boe Technology Group Co., Ltd., Beijing, CN;

Hefei Xinsheng Optoelectronics Technology Co., Ltd., Hefei, Anhui, CN;

Inventors:

Huan Wang, Beijing, CN;

Mookeun Shin, Beijing, CN;

Zhizhong Tu, Beijing, CN;

Yong Jun Yoon, Beijing, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/22 (2018.01); G09G 3/20 (2006.01); H04N 13/31 (2018.01); H04N 13/324 (2018.01); G02B 5/23 (2006.01); G02B 5/20 (2006.01); G09G 5/14 (2006.01); G09G 3/00 (2006.01);
U.S. Cl.
CPC ...
G09G 3/2003 (2013.01); G02B 5/201 (2013.01); G02B 5/23 (2013.01); G02B 27/2214 (2013.01); G09G 3/003 (2013.01); G09G 5/14 (2013.01); H04N 13/31 (2018.05); H04N 13/324 (2018.05); G09G 2300/0443 (2013.01); G09G 2300/0452 (2013.01);
Abstract

A color filter and a manufacturing method, a display panel, and a display device and a driving method are provided. The color filter includes a plurality of color resists which include red resists (R), green resists (G) and blue resists (B); and the color filter includes a plurality of pixel regions arranged in a matrix, each pixel region comprises a red sub-pixel region comprising an even number of red sub-sub-pixel regions, a green sub-pixel region including an even number of green sub-sub-pixel regions, a blue sub-pixel region including an even number of blue sub-sub-pixel regions, each red sub-sub-pixel region is provided with a red resist, each green sub-sub-pixel region is provided with a green resist, and each blue sub-sub-pixel region is provided with a blue resist. The manufacturing precision and alignment accuracy of a mask for this color filter is lower than a current technology and reduce the manufacturing difficulty.


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