The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2018

Filed:

Dec. 22, 2014
Applicant:

Orell Füssli Sicherheitsdruck Ag, Zürich, CH;

Inventors:

Sylvain Chosson, Zürich, CH;

Dieter Sauter, Dietikon, CH;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B42D 25/00 (2014.01); B42D 15/00 (2006.01); G07D 7/128 (2016.01); B42D 25/29 (2014.01); B42D 25/351 (2014.01); B41M 3/14 (2006.01); G07D 7/06 (2006.01); G07D 7/12 (2016.01); B42D 25/24 (2014.01); G07D 7/00 (2016.01);
U.S. Cl.
CPC ...
G07D 7/128 (2013.01); B41M 3/14 (2013.01); B42D 15/00 (2013.01); B42D 25/00 (2014.10); B42D 25/24 (2014.10); B42D 25/29 (2014.10); B42D 25/351 (2014.10); G07D 7/003 (2017.05); G07D 7/06 (2013.01); G07D 7/12 (2013.01); B41M 3/148 (2013.01); B42D 2035/26 (2013.01); B42D 2035/36 (2013.01);
Abstract

A security device for verifying an authenticity of a security document comprises an at least partially transparent substrate with a first surface and a second surface. A first pattern is arranged on the first surface. This first pattern is derivable using a first seed pattern. A second pattern is arranged on said second surface. This second pattern is derivable using the first seed pattern and using a second seed pattern. Transmittances and reflectivities of the first and second patterns are selected such that in a reflection viewing mode, only the first seed pattern is visible. In a transmission viewing mode, however, only the second seed pattern is visible.


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