The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Jan. 30, 2017
Dongfang Jingyuan Electron Limited, Beijing, CN;
Hua-Yu Liu, San Jose, CA (US);
Jie Lin, San Jose, CA (US);
Zhaoli Zhang, San Jose, CA (US);
Zongchang Yu, San Jose, CA (US);
Dongfang Jingyuan Electron Limited, Beijing, CN;
Abstract
A method and system for detecting defects of integrated circuits have been provided. The method comprises generating process sensitive patterns of an integrated circuit, scanning the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determining care areas of the integrated circuit using the process condition parameters, and scanning the care areas using the high-resolution system to detect at least one defect of the integrated circuit. The system comprises a processor and a memory with instructions executable by the processor to generate process sensitive patterns of an integrated circuit, scan the process sensitive patterns using a high-resolution system to provide process condition parameters of the integrated circuit, determine care areas of the integrated circuit using the process condition parameters, and scan the care areas using the high-resolution system to detect at least one defect of the integrated circuit.