The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Apr. 13, 2016
Canon Kabushiki Kaisha, Tokyo, JP;
Mitsuhide Nishimura, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An exposure method of exposing a plurality of exposure regions on a substrate includes the steps of acquiring first reference information indicating a reference height of the substrate, measuring heights of some exposure regions among the plurality of exposure regions, acquiring temporary height information indicating a temporary height of the substrate on the basis of a measurement result in the measuring step, and exposing one exposure region among the plurality of exposure regions after the substrate is moved on the basis of second reference information indicating a reference height of the one exposure region and a difference between the first reference information and the temporary height information.