The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Dec. 23, 2015
Mitsubishi Chemical Corporation, Chiyoda-ku, JP;
Koji Yamauchi, Yokohama, JP;
Minoru Torigoe, Yokohama, JP;
Mitsubishi Chemical Corporation, Chiyoda-ku, JP;
Abstract
The present invention has an object to provide a production method that can prevent side etching and delamination of an anisotropic dye coating formed by an application process, thereby providing a polarizing element that exhibits durable performance and rugged reliability and that is less affected by a solvent or the like used in a production process after formation of the anisotropic dye coating, which leads to improved flexibility of the production process. The present invention also provides a polarizing element that includes a substrate, an anisotropic dye coating, and a resin composition layer, wherein the anisotropic dye coating and the resin composition layer are sequentially layered on the substrate, wherein the top surface and all side surfaces of the anisotropic dye coating are covered with the resin composition layer, and wherein the anisotropic dye coating and the resin composition layer are not formed on portions of the substrate.