The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
Mar. 18, 2015
Applicant:
Adeka Corporation, Tokyo, JP;
Inventors:
Satoshi Yanagisawa, Tokyo, JP;
Hitomi Toda, Tokyo, JP;
Koichi Shigeno, Tokyo, JP;
Masaki Kimura, Tokyo, JP;
Assignee:
ADEKA CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 311/16 (2006.01); C07C 309/30 (2006.01); C07C 309/06 (2006.01); G03F 7/004 (2006.01); C08G 59/68 (2006.01);
U.S. Cl.
CPC ...
C07D 311/16 (2013.01); C07C 309/06 (2013.01); C07C 309/30 (2013.01); C08G 59/687 (2013.01); G03F 7/0045 (2013.01);
Abstract
Provided are: an aromatic sulfonium salt compound which exhibits low corrosion to a substrate and excellent photolithographic characteristics and is thus useful as a photoacid generator and as a cationic polymerization agent; and a photoacid generator, a resist composition, a cationic polymerization initiator and a cationically polymerizable agent composition, which include the aromatic sulfonium salt compound. The aromatic sulfonium salt compound is represented by the following Formula (I):