The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 20, 2018
Filed:
May. 12, 2017
Applicant:
Corning Incorporated, Corning, NY (US);
Inventors:
Jean-Francois Oudard, Webster, NY (US);
James Edward Platten, Penfield, NY (US);
Jue Wang, Fairport, NY (US);
Assignee:
Corning Incorporated, Corning, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); C23C 16/50 (2006.01); C03C 17/34 (2006.01); G02B 1/18 (2015.01); H01J 37/32 (2006.01); C23C 16/513 (2006.01); G02B 1/115 (2015.01); G02B 1/12 (2006.01); C03C 17/245 (2006.01);
U.S. Cl.
CPC ...
C03C 17/3417 (2013.01); C03C 17/245 (2013.01); C03C 17/2456 (2013.01); C23C 16/402 (2013.01); C23C 16/405 (2013.01); C23C 16/513 (2013.01); G02B 1/115 (2013.01); G02B 1/12 (2013.01); G02B 1/18 (2015.01); H01J 37/32009 (2013.01); C03C 2217/213 (2013.01); C03C 2217/218 (2013.01); C03C 2217/734 (2013.01); C03C 2218/153 (2013.01); H01J 2237/327 (2013.01); H01J 2237/3321 (2013.01);
Abstract
A method of forming an optical coating, including the steps: depositing a buffer layer on a glass substrate via plasma deposition at a first plasma bias voltage; and depositing at least one layer of an optical coating on the buffer layer via plasma deposition, the deposition of the optical coating carried out at a second plasma bias voltage.