The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 20, 2018

Filed:

Oct. 12, 2017
Applicant:

Purdue Research Foundation, West Lafayette, IN (US);

Inventors:

Brian Zahler Bentz, Albuquerque, NM (US);

Kevin J Webb, West Lafayette, IN (US);

Assignee:

PURDUE RESEARCH FOUNDATION, West Lafayette, IN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01D 18/00 (2006.01); B33Y 80/00 (2015.01); B33Y 10/00 (2015.01); B29C 64/129 (2017.01); A61B 6/00 (2006.01); B29C 64/40 (2017.01); G06T 11/00 (2006.01); B29L 31/40 (2006.01); H04N 5/372 (2011.01);
U.S. Cl.
CPC ...
B33Y 80/00 (2014.12); A61B 6/583 (2013.01); B29C 64/129 (2017.08); B29C 64/40 (2017.08); B33Y 10/00 (2014.12); B29K 2995/0026 (2013.01); B29L 2031/40 (2013.01); G06T 11/003 (2013.01); H04N 5/372 (2013.01);
Abstract

An optically heterogeneous phantom structure for use in optical imaging techniques. The phantom structure includes an external shape simulating an object to be subjected to an optical imaging technique, the external shape defining an external surface that encloses an internal volume of the external shape; and an optically heterogeneous material filling the internal volume and having heterogeneous optical properties for simulating at least one optical parameter of at least one region within the object. A method of producing the optically heterogeneous phantom structure. The method includes selectively depositing precursors of a first material and a second material by 3D printing so that the precursor of the second material is surrounded by the precursor of the first material within a predetermined internal region of the precursor of the first material, and forming the phantom structure. Variations of the method include additives to the materials.


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