The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Jul. 21, 2016
Nikon Corporation, Tokyo, JP;
Hideaki Hara, Kumagaya, JP;
NIKON CORPORATION, Tokyo, JP;
Abstract
An exposure apparatus includes a projection system having an optical element via which an exposure beam is projected; an immersion area forming member having an opening through which the exposure beam is projected, the immersion area forming member having a liquid supply inlet facing downward, a liquid recovery outlet facing downward, and a liquid supply port disposed between the liquid supply inlet and the liquid recovery outlet; a frame by which the projection system and the immersion area forming member are supported; a first vibration isolator by which transmission of vibration from the frame to the projection system is limited; and a second vibration isolator by which transmission of vibration from the immersion area forming member to the frame is limited. A liquid immersion area is formed, using the immersion area forming member, on a portion of an upper surface of a substrate, which is exposed to the exposure beam.