The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Apr. 09, 2015
Kuraray Co., Ltd., Kurashiki-shi, JP;
KURARAY Co., Ltd., Kurashiki-shi, JP;
Abstract
The present invention provides a method for designing a light diffusion pattern with which a light diffusion pattern to exhibit desired light diffusion properties can be designed depending on a few systematic procedures. The method includes a lens data preparation step of preparing lens data having desired light diffusion properties, a placement step of placing a plurality of lens data () prepared in the lens data preparation step in a predetermined region (), a cutting step of, when an overlap () of lenses () occurs in the placement step, cutting out a part () of a lens shape to eliminate the overlap (), and a repositioning step of replicating a shape of the cutout part () and repositioning it to another place.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile