The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Jul. 28, 2017
J. Brian Caldwell, Petersburg, VA (US);
J. Brian Caldwell, Petersburg, VA (US);
Other;
Abstract
An anamorphic objective having a relatively small anamorphic factor but with relatively pronounced residual anamorphic artifacts is formed by reducing the anamorphic factor with anamorphic lens elements located on the image side of the aperture stop. The lens section on the object side of the aperture stop must therefore have a relatively large anamorphic factor, and this creates the desired residual anamorphic artifacts. The disclosed anamorphic objective is suited either to an integrated optical design or to a modular approach in which the anamorphic factor reduction optics are connected as a removable attachment to an independently well-corrected anamorphic optical system. The anamorphic objective has a relatively small anamorphic squeeze ratio while simultaneously producing relatively large residual anamorphic characteristics.