The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Mar. 12, 2015
Raytheon Company, Waltham, MA (US);
James A. Wurzbach, San Diego, CA (US);
Kalin Spariosu, Thousand Oaks, CA (US);
Bernard Harris, Pelham, MA (US);
Eric J. Griffin, Rancho Palos Verdes, CA (US);
RAYTHEON COMPANY, Waltham, MA (US);
Abstract
A method, apparatus and system for profiling a material composition of a volume is disclosed. A beam source directs a pulsed beam of electromagnetic energy from into the volume. A plurality of backscattered beams is received at a detector. The plurality of backscattered beams is generated from a plurality of depths within the volume in response to interactions of the directed pulsed beam at the plurality of depths. A processor performs range gating of the plurality of backscattered beams to obtain a depth profile of backscattered intensity within the volume and estimates a material composition at different depths of the volume from the generated depth profile.