The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Jan. 19, 2016
Microtek Laboratories, Inc., Dayton, OH (US);
Carl M. Lentz, Waynesville, OH (US);
Teresa T. Virgallito, Beavercreek, OH (US);
Jerry K. Lawson, Riverside, OH (US);
Microtek Laboratories, INC., Dayton, OH (US);
Abstract
Methods for producing a dimensionally stable phase change material (PCM), and dimensionally stable PCMs are disclosed. The methods include providing a porous base material, mixing a phase change material having a polar functional group with a substance that increases the polar attraction of the phase change material for the porous base material to form a mixture thereof; and, thereafter, mixing the mixture with the porous base material until a selected saturation of phase change material in the porous base material is reached. The methods may include filtering the porous base material after the selected saturation is reached to form a cake of dimensionally stable PCM and, thereafter, reducing the size of the dimensionally stable PCM to an average mean particle size of about 10 to about 50 μm, or more preferably 20 to 30 μm.