The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 13, 2018
Filed:
Jun. 26, 2015
Osaka Gas Co., Ltd., Osaka-shi, JP;
Osaka Gas Co., Ltd., Osaka, JP;
Abstract
Provided herein is a method for improving a gas recovery rate during generation of a high-purity gas. The method includes providing three or more adsorption towers filled with an adsorbent that adsorbs an adsorption target gas. Performing a pressure lowering equalization process in a first adsorption tower in which an adsorption process has been finished, and in a source gas supply state in which a source gas is supplied to at least a second adsorption tower in which a pressure increasing equalization process has been finished and the adsorption process is to be subsequently performed; and transferring a non-adsorbed gas from an upper portion of the first adsorption tower to the upper portion of the second adsorption tower, thereby performing an adsorption and pressure lowering equalization process in the first adsorption tower and an adsorption and pressure increasing equalization process in the second adsorption tower.