The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 13, 2018

Filed:

Dec. 04, 2015
Applicants:

Samsung Electronics Co., Ltd., Suwon-si, KR;

Seoul National University R&db Foundation, Seoul, KR;

Inventors:

Hyun-Jae Baek, Seoul, KR;

Kwang-Suk Park, Seoul, KR;

Sang-Bae Park, Cheongju-si, KR;

Do-Yoon Kim, Seongnam-si, KR;

Jung-Taek Oh, Seoul, KR;

Jae-Geol Cho, Yongin-si, KR;

Byung-Hun Choi, Suwon-si, KR;

Sang-Won Seo, Seoul, KR;

Hee-Nam Yoon, Yongin-si, KR;

Da-Woon Jung, Yongin-si, KR;

Sang-Ho Choi, Anyang-si, KR;

Su-Hwan Hwang, Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 5/00 (2006.01); A61B 5/053 (2006.01);
U.S. Cl.
CPC ...
A61B 5/4809 (2013.01); A61B 5/0533 (2013.01); A61B 5/725 (2013.01); A61B 5/7271 (2013.01);
Abstract

Disclosed is a method for an electronic device. The method may include: acquiring a galvanic skin response; generating a first parameter for a first interval and a second parameter for a second interval based on the galvanic skin response, the second interval being an interval before the first interval; determining a first threshold corresponding to the first interval based on the second parameter; and determining an activity state of the first interval based on the first threshold and the first parameter corresponding to the first interval.


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