The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2018

Filed:

May. 19, 2016
Applicant:

Hiroshi Akino, Kanagawa, JP;

Inventor:

Hiroshi Akino, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H04R 19/01 (2006.01);
U.S. Cl.
CPC ...
H04R 19/016 (2013.01); H04R 2307/025 (2013.01);
Abstract

A diaphragm is provided that has small mechanical anisotropy even when heat is applied to the diaphragm in the production process. The diaphragm includes a biaxially stretched film stretched in a first direction (the machine direction) and a second direction (the transverse direction), wherein the entire surface of the biaxially stretched film has a first pattern and a second pattern, the first pattern has ridges and grooves with a first pitch, the second pattern has ridges and grooves with a second pitch, the second pitch is smaller than the first pitch, the second pattern is formed along the first direction or the second direction, and the length of regions defined by the first pattern in the first direction differs from the length of the regions in the second direction.


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