The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2018

Filed:

Nov. 12, 2014
Applicant:

Sharp Kabushiki Kaisha, Osaka-shi, Osaka, JP;

Inventors:

Shin Itoh, Osaka, JP;

Masahiro Konishi, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 33/64 (2010.01); H01L 33/60 (2010.01); H01L 33/44 (2010.01); H01L 33/62 (2010.01); H01L 25/075 (2006.01); H01L 33/50 (2010.01); H01L 33/56 (2010.01);
U.S. Cl.
CPC ...
H01L 33/641 (2013.01); H01L 21/02258 (2013.01); H01L 25/0753 (2013.01); H01L 33/44 (2013.01); H01L 33/502 (2013.01); H01L 33/56 (2013.01); H01L 33/60 (2013.01); H01L 33/62 (2013.01); H01L 2224/83192 (2013.01); H01L 2933/0016 (2013.01); H01L 2933/0033 (2013.01); H01L 2933/0058 (2013.01); H01L 2933/0066 (2013.01); H01L 2933/0075 (2013.01);
Abstract

In a light-emitting device substrate (), a light reflecting surface covered with an anodized aluminum layer () is formed on one side of a base (), and a glass-based insulator layer () and electrode patterns () disposed on the first insulating layer () are formed on the one side of the base () in a region not covered with the anodized aluminum layer (). A glass-based insulator layer () is formed at least on the other side of the base () that is opposite the one side of the base (). Therefore, a light-emitting device substrate having high reflectivity, high heat dissipation capability, dielectric withstand capability, and long-term reliability and excellent in mass productivity can be realized.


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