The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2018

Filed:

Sep. 08, 2016
Applicant:

Carnegie Mellon University, Pittsburgh, PA (US);

Inventors:

Marios Savvides, Wexford, PA (US);

Keshav Thirumalai Seshadri, Pittsburgh, PA (US);

Assignee:

CARNEGIE MELLON UNIVERSITY, Pittsburgh, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G06K 9/62 (2006.01); G06K 9/32 (2006.01); G06K 9/66 (2006.01);
U.S. Cl.
CPC ...
G06K 9/00248 (2013.01); G06K 9/3216 (2013.01); G06K 9/6277 (2013.01); G06K 9/66 (2013.01); G06K 2009/3225 (2013.01);
Abstract

This invention describes methods and systems for the automated facial landmark localization. Our approach proceeds from sparse to dense landmarking steps using a set of models to best account for the shape and texture variation manifested by facial landmarks across pose and expression. We also describe the use of an lregularized least squares approach that we incorporate into our shape model, which is an improvement over the shape model used by several prior Active Shape Model (ASM) based facial landmark localization algorithms.


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Savvides, Marios. (2018). Method and system for facial landmark localization (U.S. Patent No. 10121055). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10121055

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