The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2018

Filed:

Aug. 28, 2015
Applicants:

Shenzhenshi Yuzhan Precision Technology Co., Ltd., Shenzhen, CN;

Cloud Network Technology Singapore Pte. Ltd., Singapore, SG;

Inventors:

Xin-Jian Zhang, Shenzhen, CN;

Kuo-An Hsieh, New Taipei, TW;

Xian-Lin Yang, New Taipei, TW;

Xin Hou, Shenzhen, CN;

Ke-Feng Zhu, Shenzhen, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 63/00 (2006.01); B29C 63/02 (2006.01); B29L 31/46 (2006.01); B29L 31/34 (2006.01); B65H 37/00 (2006.01);
U.S. Cl.
CPC ...
B29C 63/02 (2013.01); B29L 2031/3437 (2013.01); B29L 2031/3475 (2013.01); B29L 2031/463 (2013.01); B65H 37/007 (2013.01);
Abstract

A film application apparatus includes a first base configured to couple a film material and a second base rotatably coupled to the first base. The first base defines an opening and two through holes on opposite side of the first base, the through holes communicate with the opening. The second base defines a receiving chamber and the receiving chamber is configured for accommodating a work piece. The film application apparatus further includes a pressing component inserted through the first base, the pressing component penetrating through the opening from the two through holes for pressing the film material against to a face of the work piece.


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