The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2018

Filed:

Oct. 31, 2014
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Hyung-Kyun Yu, Daejeon, KR;

Seok-Koo Kim, Daejeon, KR;

Bo-Kyung Ryu, Daejeon, KR;

Jong-Hun Kim, Daejeon, KR;

Assignee:

LG CHEM, LTD., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01M 2/18 (2006.01); H01M 2/16 (2006.01); H01M 2/14 (2006.01); C08J 9/26 (2006.01); H01M 10/052 (2010.01);
U.S. Cl.
CPC ...
H01M 2/1686 (2013.01); C08J 9/26 (2013.01); H01M 2/145 (2013.01); H01M 2/1653 (2013.01); C08J 2201/0462 (2013.01); C08J 2205/044 (2013.01); C08J 2371/08 (2013.01); C08J 2379/08 (2013.01); C08J 2381/04 (2013.01); C08J 2381/06 (2013.01); H01M 2/14 (2013.01); H01M 2/16 (2013.01); H01M 2/18 (2013.01); H01M 10/052 (2013.01);
Abstract

The present disclosure provides a porous separator substrate with an inverse opal structure obtained by using an engineering plastic resin with high heat-resistance, and a manufacturing method thereof. In the method, a non-crosslinked polymer resin is used to form an opal structure and a crosslinked polymer resin is penetrated into the opal structure and an organic solvent is used to remove the polymer particles being used to form the opal structure, thereby manufacturing a porous substrate with an inverse opal structure. According to the present disclosure, a separator having good porosity and air permeability can be provided without the problems of heat-resistance decrease, pore closing and thickness decrease.


Find Patent Forward Citations

Loading…