The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Nov. 17, 2014
Applicant:
Advanced Material Technologies, Inc., Chiba, JP;
Inventors:
Assignee:
ADVANCED MATERIAL TECHNOLOGIES, INC., Chiba, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C04B 35/491 (2006.01); H01L 41/187 (2006.01); H01L 41/319 (2013.01); H01L 41/08 (2006.01); H01L 41/318 (2013.01);
U.S. Cl.
CPC ...
H01L 41/1876 (2013.01); C04B 35/491 (2013.01); H01L 41/0815 (2013.01); H01L 41/319 (2013.01); C04B 2235/787 (2013.01); H01L 41/318 (2013.01); Y10T 428/12549 (2015.01);
Abstract
An aspect of the present invention relates to ferroelectric ceramics including a stacked film formed on a Si substrate, a Pt film formed on the stacked film, a SrTiOfilm formed on the Pt film, and a PZT film formed on the SrTiO, wherein the stacked film is formed by repeating sequentially N times a first ZrOfilm and a YOfilm, and a second ZrOfilm is formed on the film formed repeatedly N times, the N being an integer of 1 or more. It is preferable that a ratio of Y/(Zr+Y) of the stacked film is 30% or less.