The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Jan. 08, 2014
Sakai Display Products Corporation, Sakai-shi, Osaka, JP;
Masahiro Kato, Sakai, JP;
Satoru Utsugi, Sakai, JP;
Sakai Display Products Corporation, Sakai-shi, Osaka, JP;
Abstract
Provided is a manufacturing method for an active matrix substrate, capable of providing a hole for alignment at an interlayer dielectric film without possible etching of a substrate surface and abnormal electric discharge and of allowing the position of a formed film to be easily corrected to be aligned with the position of the film of the lowest layer, with high overlaying precision. Also provided are the active matrix substrate and a display apparatus comprising the active matrix substrate. An interlayer dielectric filmof the active matrix substrate is formed using an SOG material with photosensitivity, and an adjustment holefor adjustment of the patterns of a gate insulation film, a first semiconductor film, a second semiconductor filmand a source metal that are formed on the upper side of a substrateand the interlayer dielectric filmis formed. The position of each film is adjusted while viewing an edge of the gate wiringthrough the adjustment hole