The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Mar. 14, 2016
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventor:
Ching-Jung Chang, Taichung, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/677 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67721 (2013.01); H01L 21/67225 (2013.01); H01L 21/67706 (2013.01); H01L 21/67727 (2013.01); H01L 21/67733 (2013.01); H01L 21/67766 (2013.01); H01L 21/67769 (2013.01);
Abstract
A fabrication system comprises placing an internal buffer at a default position of a local system, wherein the default position is a first boundary between a first service area and a second service area, loading a reticle from a first apparatus into a first carrier, wherein the first apparatus and the first carrier is located in the first service area, determining whether a conflicting reticle transfer event occurs in the second service area and transporting the reticle to a second apparatus in the second service area.