The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2018

Filed:

Jan. 30, 2015
Applicant:

Screen Holdings Co., Ltd., Kyoto, JP;

Inventor:

Kurumi Yagi, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); H01L 21/6708 (2013.01); H01L 21/67028 (2013.01); H01L 21/67063 (2013.01);
Abstract

A substrate processing apparatus includes a spin chuck, a shielding member disposed over the substrate, a cup surrounding a spin base, an upper gas valve that makes an inert gas be discharged from a downward discharge port of the shielding member, and an exhaust duct that discharges a gas in the cup. The shielding member includes an opposed surface disposed over the substrate and an inner peripheral surface surrounding the substrate. The lower end of the inner peripheral surface of the shielding member is disposed in the periphery of the spin base. The distance in the radial direction from the lower end of the inner peripheral surface of the shielding member to an outer peripheral surface of the spin base is not less than the distance in the vertical direction from an upper surface of the substrate to the opposed surface.


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