The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Aug. 31, 2016
Applicant:
Samsung Electronics Co., Ltd., Suwon-si, Gyeonggi-do, KR;
Inventors:
Suyoung Lee, Seongnam-si, KR;
Tamamushi Shuichi, Hwaseong-si, KR;
Byunggook Kim, Seoul, KR;
Byoungsup Ahn, Seongnam-si, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/302 (2006.01); H01J 37/04 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/302 (2013.01); H01J 37/045 (2013.01); H01J 37/3177 (2013.01); H01J 2237/0432 (2013.01); H01J 2237/0437 (2013.01);
Abstract
A system includes an aperture array comprising a plurality of active apertures, respective ones of the active apertures configured to selectively deflect beams passing therethrough. The system also includes a limiting aperture configured to pass beams not deflected by the active apertures to a target object. The system further includes a control circuit configured to control the active apertures to provide first and second different exposure duration resolutions.