The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Oct. 26, 2016
Samsung Electronics Co., Ltd., Suwon-si, KR;
SAMSUNG ELECTRONICS CO., LTD., Suwon-si, Gyeonggi-Do, KR;
Abstract
A method of generating a ray tracing acceleration structure includes transformatively mapping locations of object primitives in a three dimensional first space into Morton codes indicating respective locations of the primitives along a meandering linear path through the first space; determining a Morton distance indicating a difference between a first Morton code corresponding with a first primitive and a second Morton code corresponding with a second primitive; generating an acceleration structure to include nodes representing portions of the first space and adaptively adjusting a reference level of the acceleration structure, based on the Morton distance between primitives; and dividing the first space using a first division method when a level of a first node of the acceleration structure which corresponds to the first space is lower than the reference level, and dividing the first space using a second division method when the level of the first node exceeds the reference level.