The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2018

Filed:

Jan. 13, 2012
Applicants:

Kenneth A. Epstein, St. Paul, MN (US);

Adam D. Haag, Woodbury, MN (US);

Seo-hern Lee, Kyonggi-Do, KR;

Youn Sihn Kim, Seoul, KR;

Myeong-kyun Kang, Gyeonggi-Do, KR;

Inventors:

Kenneth A. Epstein, St. Paul, MN (US);

Adam D. Haag, Woodbury, MN (US);

Seo-Hern Lee, Kyonggi-Do, KR;

Youn Sihn Kim, Seoul, KR;

Myeong-Kyun Kang, Gyeonggi-Do, KR;

Assignee:

3M INNOVATIVE PROPERTIES COMPANY, Saint Paul, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01); G02F 1/1335 (2006.01); G02B 5/02 (2006.01); G02F 1/13363 (2006.01);
U.S. Cl.
CPC ...
G02B 5/3083 (2013.01); G02B 5/0215 (2013.01); G02B 5/3041 (2013.01); G02F 1/133536 (2013.01); G02F 1/133634 (2013.01);
Abstract

Optical film stacks are disclosed. The optical film stacks can include a first reflective polarizer, a second reflective polarizer, and a retardance layer disposed between the first reflective polarizer and the second reflective polarizer.


Find Patent Forward Citations

Epstein, Kenneth. (2018). Optical film stack with retardance layer having in-plane retardance of greater than 2.0 microns (U.S. Patent No. 10114162). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10114162

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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