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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10114016 B1

PDFFull Text
Date of Patent:
Oct. 30, 2018

Filed:

Aug. 22, 2009

Particles and manufacturing methods thereof

Applicants:

Yeu-kuang Hwu, Taipei, TW;

Chang-hai Wang, Taipei, TW;

Chi-jen Liu, Taipei, TW;

Cheng-liang Wang, Taipei, TW;

Chi-hsiung Chen, Taipei, TW;

Chung-shi Yang, Miaoli, TW;

Hong-ming Lin, Taipei, TW;

Jung-ho Je, Pohang, KR;

Giorgio Margartondo, Renens, CH;

Inventors:

Yeu-Kuang Hwu, Taipei, TW;

Chang-Hai Wang, Taipei, TW;

Chi-Jen Liu, Taipei, TW;

Cheng-Liang Wang, Taipei, TW;

Chi-Hsiung Chen, Taipei, TW;

Chung-Shi Yang, Miaoli, TW;

Hong-Ming Lin, Taipei, TW;

Jung-Ho Je, Pohang, KR;

Giorgio Margartondo, Renens, CH;

Assignee:

Other;

Attorneys:

Pai Patent & Trademark Law Firm

Chao-Chang David Pai

Primary Examiner:

George Wyszomierski

Int. Cl.
CPC ...
B22F 9/24 (2006.01); G01N 33/543 (2006.01); B22F 1/00 (2006.01); B22F 9/02 (2006.01); B82Y 30/00 (2011.01); C01B 13/36 (2006.01); C01B 33/12 (2006.01); C01G 49/08 (2006.01); C09C 1/00 (2006.01); C09C 1/04 (2006.01); C09C 1/30 (2006.01); C09C 1/36 (2006.01); C09C 1/62 (2006.01); C09C 3/04 (2006.01);
U.S. Cl.
CPC ...
G01N 33/5434 (2013.01); B22F 1/0022 (2013.01); B22F 1/0062 (2013.01); B22F 9/02 (2013.01); B82Y 30/00 (2013.01); C01B 13/36 (2013.01); C01B 33/12 (2013.01); C01G 49/08 (2013.01); C09C 1/0081 (2013.01); C09C 1/04 (2013.01); C09C 1/309 (2013.01); C09C 1/3072 (2013.01); C09C 1/3081 (2013.01); C09C 1/36 (2013.01); C09C 1/62 (2013.01); C09C 3/04 (2013.01); G01N 33/54346 (2013.01); B22F 2999/00 (2013.01); C01P 2002/72 (2013.01); C01P 2002/84 (2013.01); C01P 2004/03 (2013.01); C01P 2004/04 (2013.01); C01P 2004/62 (2013.01); C01P 2004/64 (2013.01); C01P 2006/12 (2013.01); Y10T 428/12181 (2015.01); Y10T 428/249994 (2015.04); Y10T 428/2991 (2015.01);
Abstract

Particles and manufacturing methods thereof are provided. The manufacturing method of the particle includes providing a precursor solution containing a precursor dissolved in a solution, and irradiating the precursor solution with a high energy and high flux radiation beam to convert the precursor to nano-particles. Particles with desired dispersion, shape, and size are manufactured without adding a stabilizer or surfactant to the precursor solution.

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