The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2018

Filed:

May. 28, 2015
Applicant:

Brown University, Providence, RI (US);

Inventor:

Humphrey J. Maris, Barrington, RI (US);

Assignee:

BROWN UNIVERSITY, Providence, RI (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 3/00 (2006.01); G01B 11/16 (2006.01); G01L 1/24 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 11/16 (2013.01); G01L 1/24 (2013.01); H01L 22/12 (2013.01);
Abstract

Methods and systems are disclosed for measuring multidimensional stress characteristics in a substrate. Generally, the methods include applying a sequence of optical pump pulses to the substrate. The optical pump pulses induce a propagating strain pulse in the substrate. Optical probe pulses are also applied. By analyzing transient optical responses caused by the propagating strain pulse, multidimensional stress components characterizing the stress in the substrate can be determined. Multidimensional stress components may also be determined at a depth of a substrate. Multidimensional stress components may also be determined at areas adjacent a through-silicon via.


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