The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Sep. 19, 2016
Applicant:
Xerox Corporation, Norwalk, CT (US);
Inventors:
Guiqin Song, Milton, CA;
Naveen Chopra, Oakville, CA;
Nan-Xing Hu, Oakville, CA;
Biby Esther Abraham, Mississauga, CA;
Michelle N Chretien, Mississauga, CA;
Assignee:
Xerox Corporation, Norwalk, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/48 (2006.01); C09D 175/16 (2006.01); B29C 35/02 (2006.01); B41M 5/00 (2006.01); C09D 133/08 (2006.01); B05D 3/06 (2006.01); B05D 7/00 (2006.01); C08K 3/08 (2006.01); C09D 11/52 (2014.01); C09D 133/14 (2006.01); C09D 135/02 (2006.01); C09D 4/00 (2006.01); C09D 5/00 (2006.01); H05K 3/38 (2006.01); C08F 2/38 (2006.01); H05K 1/09 (2006.01); H05K 3/12 (2006.01); C08F 220/28 (2006.01); C08F 222/10 (2006.01);
U.S. Cl.
CPC ...
C09D 133/08 (2013.01); B05D 3/067 (2013.01); B05D 7/50 (2013.01); C08F 2/38 (2013.01); C08K 3/08 (2013.01); C09D 4/00 (2013.01); C09D 5/002 (2013.01); C09D 11/52 (2013.01); C09D 133/14 (2013.01); C09D 135/02 (2013.01); H05K 3/386 (2013.01); C08F 2220/281 (2013.01); C08F 2220/282 (2013.01); C08F 2222/1013 (2013.01); C08K 2003/0806 (2013.01); C08K 2201/001 (2013.01); C08K 2201/005 (2013.01); C08K 2201/011 (2013.01); H05K 1/097 (2013.01); H05K 3/1208 (2013.01);
Abstract
UV-curable interlayer compositions are provided. An interlayer composition may contain a polyallyl isocyanurate compound, an ester of β-mercaptopropionic acid, a monofunctional (meth)acrylate monomer having one or more cyclic groups, and a photoinitiator. Processes of using the interlayer compositions to form multilayer structures and the multilayer structures are also provided.