The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Apr. 04, 2017
Applicant:
Toshiba Memory Corporation, Tokyo, JP;
Inventors:
Kei Kobayashi, Yokohama, JP;
Seiji Morita, Tokyo, JP;
Assignee:
Toshiba Memory Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08G 65/26 (2006.01); G03F 7/00 (2006.01); C08G 59/02 (2006.01); C08F 216/36 (2006.01);
U.S. Cl.
CPC ...
C08G 65/2609 (2013.01); C08F 216/36 (2013.01); C08G 59/02 (2013.01); G03F 7/0002 (2013.01);
Abstract
In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.