The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 30, 2018
Filed:
Jul. 21, 2015
Applicants:
Jin Park, Yongin-si, KR;
Hyun-woo Kim, Seongnam-si, KR;
Inventors:
Jin Park, Yongin-si, KR;
Hyun-Woo Kim, Seongnam-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); C08F 214/14 (2006.01); C08F 214/16 (2006.01); C08F 214/18 (2006.01); G03F 7/038 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/34 (2006.01); C08G 75/26 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
C08F 214/14 (2013.01); C08F 214/16 (2013.01); C08F 214/18 (2013.01); C08G 75/26 (2013.01); G03F 7/038 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/16 (2013.01); G03F 7/20 (2013.01); G03F 7/34 (2013.01);
Abstract
A photoresist polymer is synthesized from a repeating unit that comprises a first leaving group including an ester group, and a second leaving group capable of being removed together with the first leaving group.