The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 30, 2018

Filed:

Sep. 19, 2014
Applicant:

Panasonic Corporation, Osaka, JP;

Inventors:

Masayuki Mantani, Yamanashi, JP;

Toshiyuki Murakami, Yamanashi, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 13/00 (2006.01); B23K 37/04 (2006.01); B23K 3/08 (2006.01); B41F 35/00 (2006.01); B41F 15/08 (2006.01); B41F 15/26 (2006.01); B41F 15/46 (2006.01); H05K 13/04 (2006.01); B23K 3/06 (2006.01);
U.S. Cl.
CPC ...
B23K 37/0408 (2013.01); B23K 3/08 (2013.01); B41F 15/0881 (2013.01); B41F 15/26 (2013.01); B41F 15/46 (2013.01); B41F 35/005 (2013.01); H05K 13/0465 (2013.01); B23K 3/0638 (2013.01); B41P 2215/114 (2013.01); B41P 2235/242 (2013.01); B41P 2235/244 (2013.01); B41P 2235/246 (2013.01);
Abstract

A screen printer includes: a substrate holder that holds a substrate; a mask to be contacted with the substrate; an imaging device that images the substrate; an elevation mechanism that moves up the substrate holder at a below-mask-position below the mask based on a result of the imaging to contact the substrate with the mask; a horizontal moving mechanism that moves the substrate holder between the below-mask-position and a retreat position retreated in a horizontal direction from the below-mask-position; a printing head that moves on the mask contacted with the substrate and prints a paste on the substrate via the mask; and a mask cleaner that cleans a lower surface of the mask with the substrate separated from the mask by the elevation mechanism. The imaging of the substrate and the cleaning of the mask are performed with the substrate holder positioned at the retreat position.


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