The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Nov. 20, 2017
Affectlayer, Inc., Tel Aviv-Yafo, IL;
Roy Raanani, Mill Valley, CA (US);
Russell Levy, Raanana, IL;
Dominik Facher, San Francisco, CA (US);
Micha Yochanan Breakstone, Raanana, IL;
AffectLayer, Inc., Tel Aviv-Yafo, IL;
Abstract
A pattern recognition system ('system') automatically determines conversation patterns that distinguish a first set of participants from a second set of participants. For example, a first set of participants can be top performing representatives and the second set of participants can be low performing representatives. The system analyzes a first set of recordings of the top performing representatives to extract a first set of features associated with the first set of recordings, and analyzes the first set of features to generate first pattern data that is indicative of a pattern of the conversation of the top performing representatives. Similarly, the system also generates second pattern data that is indicative of a pattern of the conversation of the low performing representatives. The system analyzes the first pattern data and the second pattern data to generate distinctive features that distinguish the first pattern from the second pattern.