The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Jun. 22, 2017
Applicant:

Abb Schweiz Ag, Baden, CH;

Inventors:

Liutauras Storasta, Lenzburg, CH;

Chiara Corvasce, Bergdietikon, CH;

Manuel Le Gallo, Wallisellen, CH;

Munaf Rahimo, Uezwil, CH;

Arnost Kopta, Zürich, CH;

Assignee:

ABB Schweiz AG, Baden, CH;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/66 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/10 (2006.01); H01L 29/36 (2006.01); H01L 29/40 (2006.01); H01L 29/08 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7395 (2013.01); H01L 29/063 (2013.01); H01L 29/0615 (2013.01); H01L 29/0619 (2013.01); H01L 29/0692 (2013.01); H01L 29/0696 (2013.01); H01L 29/0865 (2013.01); H01L 29/1004 (2013.01); H01L 29/1095 (2013.01); H01L 29/36 (2013.01); H01L 29/402 (2013.01); H01L 29/7811 (2013.01); H01L 29/7819 (2013.01); H01L 29/7823 (2013.01); H01L 29/0834 (2013.01);
Abstract

A reverse-conducting MOS device is provided having an active cell region and a termination region. Between a first and second main side. The active cell region comprises a plurality of MOS cells with a base layer of a second conductivity type. On the first main side a bar of the second conductivity type, which has a higher maximum doping concentration than the base layer, is arranged between the active cell region and the termination region, wherein the bar is electrically connected to the first main electrode. On the first main side in the termination region a variable-lateral-doping layer of the second conductivity type is arranged. A protection layer of the second conductivity type is arranged in the variable-lateral-doping layer, which protection layer has a higher maximum doping concentration than the maximum doping concentration of the variable-lateral-doping layer in a region attached to the protection layer.


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