The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Jun. 14, 2017
Applicant:

Sandisk Technologies Llc, Plano, TX (US);

Inventors:

Sebastian J. M. Wicklein, San Jose, CA (US);

Juan P. Saenz, Menlo Park, CA (US);

Srikanth Ranganathan, Fremont, CA (US);

Ming-Che Wu, San Jose, CA (US);

Tanmay Kumar, Pleasanton, CA (US);

Assignee:

SanDisk Technologies LLC, Addison, TX (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/24 (2006.01); H01L 45/00 (2006.01); G11C 13/00 (2006.01);
U.S. Cl.
CPC ...
H01L 27/249 (2013.01); G11C 13/0007 (2013.01); H01L 45/08 (2013.01); H01L 45/1233 (2013.01); H01L 45/1246 (2013.01); H01L 45/1253 (2013.01); H01L 45/145 (2013.01); H01L 45/146 (2013.01); H01L 45/147 (2013.01); H01L 45/148 (2013.01); H01L 45/149 (2013.01); H01L 45/1608 (2013.01); G11C 13/004 (2013.01); G11C 13/0023 (2013.01); G11C 13/0069 (2013.01); G11C 2213/31 (2013.01); G11C 2213/32 (2013.01); G11C 2213/34 (2013.01); G11C 2213/35 (2013.01); G11C 2213/51 (2013.01); G11C 2213/71 (2013.01);
Abstract

A method is provided that includes forming a word line above a substrate, forming a bit line above the substrate, forming a nonvolatile memory material between the word line and the bit line, the nonvolatile memory material including a semiconductor material layer and a conductive oxide material layer, forming a barrier material layer between the semiconductor material layer and the conductive oxide material layer, and forming a memory cell including the nonvolatile memory material at an intersection of the bit line and the word line. The word line is disposed in a first direction, the bit line is disposed in a second direction perpendicular to the first direction. The barrier material layer has an ionic conductivity of greater than about 0.1 Siemens/cm @ 1000° C.


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