The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Jan. 22, 2016
Applicant:

Wuhan China Star Optoelectronics Technology Co., Ltd., Wuhan, Hubei, CN;

Inventors:

Yu Zhao, Guangdong, CN;

Zhandong Zhang, Guangdong, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01); H01L 29/78 (2006.01); G02F 1/13 (2006.01); H01L 29/786 (2006.01); G02F 1/1368 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1222 (2013.01); G02F 1/1368 (2013.01); H01L 27/127 (2013.01); H01L 29/78603 (2013.01); H01L 29/78696 (2013.01);
Abstract

The present disclosure a semiconductor layer structure having an insulating substrate and a semiconductor layer formed on the insulating substrate. The semiconductor layer includes a source signal access terminal, a drain signal access terminal, a first semiconductor layer pattern and a second semiconductor layer pattern; the first semiconductor layer pattern and the second semiconductor layer pattern formed between the source signal access terminal and the drain signal access terminal in parallel. The present disclosure also provides a method for fabricating a semiconductor layer structure.


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