The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Sep. 07, 2016
SK Hynix Inc., Gyeonggi-do, KR;
Seung-Hwan Kim, Gyeonggi-do, KR;
SK Hynix Inc., Gyeonggi-do, KR;
Abstract
A method for fabricating a semiconductor device may include: forming a plurality of first isolation trenches and a plurality of line-shaped active regions by etching a semiconductor substrate; forming a line-shaped device isolation region in each of the plurality of first isolation trenches; forming a plurality of second isolation trenches extending in a second direction by etching the plurality of line-shaped active regions and the plurality of line-shaped device isolation regions; forming a connection trench to connect the plurality of second isolation trenches to each other; forming a shielding line in each of the plurality of second isolation trenches; and forming a shielding line interconnection in the connection trench.