The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Dec. 22, 2014
Applicant:
The Chemours Company Fc, Llc, Wilmington, DE (US);
Inventors:
Assignee:
THE CHEMOURS COMPANY FC, LLC, Wilmington, DE (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/3065 (2006.01); C09K 13/08 (2006.01); C09K 13/00 (2006.01); C23C 16/44 (2006.01); C23G 5/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31116 (2013.01); C09K 13/00 (2013.01); C09K 13/08 (2013.01); C23C 16/4405 (2013.01); C23G 5/00 (2013.01); H01J 37/32009 (2013.01); H01J 37/3244 (2013.01); H01L 21/3065 (2013.01); H01L 21/31144 (2013.01); H01J 2237/334 (2013.01); H01J 2237/3321 (2013.01); Y02C 20/30 (2013.01); Y02P 70/605 (2015.11);
Abstract
The present invention relates to fluoroolefin compositions useful as gases for CVD semiconductor manufacture, particularly for etching applications including methods for removing surface deposits from the interior of a chemical vapor deposition chamber by using an activated gas mixture, and methods for etching the surface of a semiconductor.
Peng, Sheng. (2018). Chamber cleaning and semiconductor etching gases (U.S. Patent No. 10109496). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10109496
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile