The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Feb. 28, 2018
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Marc Adam Bergendahl, Troy, NY (US);
James John Demarest, Rensselaer, NY (US);
Christopher J. Penny, Saratoga Springs, NY (US);
Roger Allen Quon, Rhinebeck, NY (US);
Christopher Joseph Waskiewicz, Rexford, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/26 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/261 (2013.01); H01J 37/28 (2013.01); H01J 2237/206 (2013.01); H01J 2237/2802 (2013.01); H01J 2237/3114 (2013.01);
Abstract
A system for performing diffraction analysis, includes a focused ion beam (FIB) device for preparing a sample, a mill for removing a surface portion of the prepared sample, and an analyzer for performing diffraction analysis on the milled sample.
Bergendahl, Marc. (2018). System and method for performing nano beam diffraction analysis (U.S. Patent No. 10109455). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10109455
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile