The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Feb. 13, 2017
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Georg Jost, Munich, DE;
Ludwig Ledl, Gröbenzell, DE;
Bernhard G. Mueller, Finsing, DE;
George Tzeng, Sunnyvale, CA (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/02 (2006.01); H01J 37/18 (2006.01); H01J 37/26 (2006.01);
U.S. Cl.
CPC ...
H01J 37/026 (2013.01); H01J 37/18 (2013.01); H01J 37/26 (2013.01); H01J 2237/0047 (2013.01);
Abstract
A charge control apparatus for controlling charge on a substrate in a vacuum chamber is described. The apparatus includes a light source emitting a beam of radiation having a divergence; a mirror configured to reflect the beam of radiation, wherein a curvature of a mirror surface of the curved mirror is configured to reduce the divergence of the beam of radiation; and a mirror support configured to rotatably support the curved mirror, wherein a rotation of the mirror varies the direction of the beam of radiation.