The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Nov. 21, 2016
Applicant:

Seiko Epson Corporation, Tokyo, JP;

Inventors:

Liwen Xu, North York, CA;

Joseph Chi Tai Lam, North York, CA;

Alex Levinshtein, Maple, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 19/00 (2011.01); G06K 9/46 (2006.01); G06T 7/00 (2017.01); G06K 9/62 (2006.01); H04N 13/204 (2018.01);
U.S. Cl.
CPC ...
G06T 7/004 (2013.01); G06K 9/4604 (2013.01); G06K 9/6202 (2013.01); G06K 9/6269 (2013.01); G06T 7/0081 (2013.01); H04N 13/204 (2018.05); G06T 2207/10028 (2013.01);
Abstract

A machine vision system and method uses captured depth data to improve the identification of a target object in a cluttered scene. A 3D-based object detection and pose estimation (ODPE) process is use to determine pose information of the target object. The system uses three different segmentation processes in sequence, where each subsequent segmentation process produces larger segments, in order to produce a plurality of segment hypotheses, each of which is expected to contain a large portion of the target object in the cluttered scene. Each segmentation hypotheses is used to mask 3D point clouds of the captured depth data, and each masked region is individually submitted to the 3D-based ODPE.


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