The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 23, 2018
Filed:
Jun. 23, 2014
Applicant:
Boe Technology Group Co., Ltd., Beijing, CN;
Inventors:
Assignee:
BOE TECHNOLOGY GROUP CO., LTD., Beijing, CN;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/031 (2006.01); G03F 7/029 (2006.01); G03F 7/028 (2006.01); G03F 7/027 (2006.01); G03F 7/032 (2006.01); G03F 7/004 (2006.01); G03F 7/30 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/031 (2013.01); G03F 7/0048 (2013.01); G03F 7/027 (2013.01); G03F 7/028 (2013.01); G03F 7/029 (2013.01); G03F 7/032 (2013.01); G03F 7/20 (2013.01); G03F 7/30 (2013.01);
Abstract
The present disclosure provides a photosensitive resin composition and a method for forming a quantum dot pattern using the same. The photosensitive resin composition includes quantum dots which are dispersed in the photosensitive resin composition and each has a modification layer. The method for forming a quantum dot pattern includes coating, exposing and developing a photoresist to obtain the quantum dot pattern, wherein the photoresist is the above-mentioned photosensitive resin composition.