The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 23, 2018

Filed:

Aug. 10, 2011
Applicants:

G. Laurie Miller, Eastham, MA (US);

Boguslaw A. Swedek, Cupertino, CA (US);

Manoocher Birang, Los Gatos, CA (US);

Inventors:

G. Laurie Miller, Eastham, MA (US);

Boguslaw A. Swedek, Cupertino, CA (US);

Manoocher Birang, Los Gatos, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 7/06 (2006.01); B24B 37/013 (2012.01); B24B 49/10 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
B24B 37/013 (2013.01); B24B 49/105 (2013.01); G01B 7/10 (2013.01); H01L 21/67253 (2013.01);
Abstract

An eddy current monitoring system may include an elongated core. One or more coils may be coupled with the elongated core for producing an oscillating magnetic field that may couple with one or more conductive regions on a wafer. The core may be translated relative to the wafer to provide improved resolution while maintaining sufficient signal strength. An eddy current monitoring system may include a DC-coupled marginal oscillator for producing an oscillating magnetic field at a resonant frequency, where the resonant frequency may change as a result of changes to one or more conductive regions. Eddy current monitoring systems may be used to enable real-time profile control.


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