The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10105799 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 23, 2018

Filed:

Sep. 08, 2015
Applicant:

Jtekt Corporation, Osaka-shi, Osaka, JP;

Inventor:

Takaaki Onizuka, Kashiwara, JP;

Assignee:

JTEKT CORPORATION, Osaka-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23P 11/00 (2006.01); B60B 27/00 (2006.01);
U.S. Cl.
CPC ...
B23P 11/005 (2013.01); B60B 27/0031 (2013.01); B60B 27/0084 (2013.01); B60B 2310/206 (2013.01); B60B 2310/213 (2013.01); Y10T 29/49533 (2015.01); Y10T 29/49535 (2015.01); Y10T 29/49536 (2015.01); Y10T 29/49833 (2015.01); Y10T 29/49845 (2015.01);
Abstract

An axial section of a continuous portion where an outer peripheral surface of a spindle portion of a main spindle in which a punch is installed is continuous with an outer peripheral surface of a punch holder is formed of a first circular arc joined to the outer peripheral surface of the spindle portion and a second circular arc joined to the outer peripheral surface of the punch holder. The first circular arc and the second circular arc are in contact with each other. The second circular arc is smaller than the first circular arc in curvature radius.


Find Patent Forward Citations

Onizuka, Takaaki. (2018). Hub unit manufacturing apparatus (U.S. Patent No. 10105799). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10105799

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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