The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Jan. 12, 2018
Applicant:
Bae Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Inventors:
Chia-Lie Chang, Potomac, MD (US);
Peter A. Budni, Nashua, NH (US);
Assignee:
BAE Systems Information and Electronic Systems Integration Inc., Nashua, NH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 1/46 (2006.01); H01S 3/11 (2006.01); H01S 3/16 (2006.01);
U.S. Cl.
CPC ...
H05H 1/46 (2013.01); H01S 3/11 (2013.01); H01S 3/1625 (2013.01); H01S 3/1636 (2013.01); H05H 2001/4607 (2013.01);
Abstract
The system and method for creating plasma flares in air by using an ultra-short pulse laser (USPL) that generates plasma filaments with a short lifetime (in nanoseconds), and by heating these plasma filaments with intense microwave (RF) radiation to induce robust air breakdown, resulting in long lifetime (up to milliseconds) plasma flares in the atmosphere.
Chang, Chia-Lie. (2018). Long lifetime plasma flares by laser breakdown of air with intense rf heating (U.S. Patent No. 10104756). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10104756
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile