The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 16, 2018

Filed:

Feb. 22, 2016
Applicant:

Denso Corporation, Kariya, Aichi-pref., JP;

Inventors:

Masakiyo Sumitomo, Kariya, JP;

Masahiro Ogino, Kariya, JP;

Yukihiro Kato, Kariya, JP;

Assignee:

DENSO CORPORATION, Kariya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/739 (2006.01); H01L 23/485 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7394 (2013.01); H01L 23/485 (2013.01); H01L 29/78 (2013.01);
Abstract

A semiconductor device includes: a semiconductor substrate having a drift layer; a base layer and a carrier storage layer over the drift layer; a collector layer on the drift layer opposite to the base layer; multiple trenches penetrating the base layer and the carrier storage layer and reaching the drift layer; a gate electrode on an insulation film in each trench; and an emitter region in a surface portion of the base layer contacting each trench. A thickness of at least a portion of a part of the gate insulation film on a sidewall of each trench on a collector layer side from a peak position, at which the impurity concentration of the carrier storage layer is highest, is thicker than a thickness of another part of the gate insulation film on the sidewall of an opening portion side of the trench from the peak position.


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